CVD is one good choice for compound films, multi element oxides or single oxide layers. Single layers of oxides can also be deposited through ebeam evaporation but the stoichiometery may be effected that can be maintained through controlled leakage of oxygen onto the substrate (chamber). Sputtering process can also produce layers of oxide material.
For the preparation of multicomponent oxides,I.e, high temperature oxide superconductors, laser abalation technique may be used to maintain stoichiometry so that the oxygen content remains the same.