11 April 2016 33 5K Report

I regularly encounter hazing (deterioration) of my silver thin films when depositing it onto SiO2. The SiO2 was grown by PECVD (SiH4+N2O) and the hazing appears after 12 hours at room conditions. Sometimes it takes longer to appear and at other times it does not appear at all.

Has anybody else encountered this problem before?

How did you attempt to rectify/prevent it.

Thanks in advance!

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