Hello,
I am a graduate student woking with Radiofrequency plasmas for chemical reactions and materials synthesis. I'd be extremely grateful if you can recommend me some literature or publications which can help me understand the selection of configuration and range of impedance for the matching network. Is there a way to measure the impedance of a chamber?
My reactor is Inductively Coupled Plasma using external RF coils and a quartz tube (1 inch) passing through the center of it. I'm trying to strike plasma in a 1/4 in OD tube but am not successful with it.
Optimal plasma core diameter in ICP depends first of all on a frequency of electromagnetic field in the coil. Generally electromagnetic energy in the ICP is storing and oscillating in the output RF circuit including output coil. A part of the energy emitted by the coil as oscillating electric and magnetic field is partially reflecting back to the circuit from the plasma inside the coil and partially is absorbed by the plasma. The thickness of the energy deposition layer in plasma is determined by a thickness of current layer governed by skin-effect in plasma. The diameter of the output coil is generally designed to be about several times of skin-layer thickness. This diameter is treated to be optimal for ICP plasma stability. Thus the higher is frequency, the smaller is the coil and plasma diameter.
Some basics on the ICP plasma and bibliogrphy may be found in Plasma Chemistry by Alexander Fridman, Cambridge University Press, 2008.
Chemically reactive plasma discharges are widely used to modify the surface properties of materials It is due to this development that plasma processing has now become an essential process of some of the largest manufacturing industries in the world Most applications based on plasma enhanced chemical processing focus on treating solid surfaces, film deposition, modification of surfaces, and etching of surface layers. The atoms of the gas “'break down” or “decompose” into freely moving charged particles that form a weakly ionised plasma The plasma state is generated due to sufficient energy being supplied to the gas atoms from the external source that results in ionisation of the gas atoms. At construction of RF plasma generators there is a need for sources of RF power capable to work in polyharmonic mode and permitting to execute distributed input of energy to a reactor volume. It is offered to use a modified discrete distributed amplifier (DDA) as a power source for the extended RF capacitively coupled low-temperature plasma generator.
Thank you, Mikhail. I got a starting point to read more about it. I'll go through the book.
You may be interested in "Physics of Radio-Frequency Plasmas " by
Pascal Chabert and Nicholas Braithwaite, Cambridge University Press 2011
Go to the following link:
https://www.cambridge.org/core/books/physics-of-radiofrequency-plasmas/07AF7D2152B32335BFD5F96ADDC7CE83
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