I have fabricated a Schottky junction (100nm Au on nGaAs substrate with Ohmic contact of AuGe(100nm)/Ni(30nm)/Au(50nm) on nGaAs) using ebeam evaporation...When I perform I-V measurements, there has been times where a current range of 500mA (or sometimes even lower) passes through the device and after that there is black hole (dot) on the surface of Schottky layer (where probe was touching). The device I-V characteristics becomes linear (previously it was a nice diode-like curve) and to me it seems like device is failing. What can be done to increase the tolerance of the device to withstand higher currents?

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