Is there any way to deposit TCO at low temperature so that lower CZTS/CdS layer is not affected.
what is the necessity of TCO? If we do not deposit TCO and directly form contact over CZTS/CdS or CZTS/CdS/ZnO then what possible problems i will face in achieving high efficiency.
You can deposit TCO by using sputtering method. You can deposit at lower temperature.
You will need TCO depending on your application. For example, for light emitting devices, TCO will not block light coming out from the surface of the device. You can deposit a thin layer of contact metal over TCO for better electrical conductivity.
Thank you Suja . I am actually facing problem with the sputtering unit, so need any other solution based method of deposition of TCO at lower temperature.
Dear Goutam,
Welcome you can directly metallize the ZS film but the metallization must be partial to allow the passage of light to the active material. It may be inform of figures as in the silicon solar cells.
You can also deposit ITO directly on glass by Preparation of ITO films using a spray pyrolysis solution containing an acetylacetone chelating agent. And then completely metallize the ZS. In this case you do not need Mo metallization as the transparent ITO behaves like a metal.
For more information about the pyrolysis follow the link:www.degruyter.com/downloadpdf/j/msp.2014.32.issue-1/s13536-013-0159-8/s13536-013-0159-8.pdf
Best wishes
Dear Goutam,
You can use AZO ink (http://www.sigmaaldrich.com/catalog/product/aldrich/793388?lang=en®ion=IN). But, you might have to optimise for uniform deposition either by spin coating or some printing technique. Later, sintering is required to improve conductivity. All the best !!
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