When I do the PPC-PC reverse dry transfer method, PPC and the sample fall on the PC, and then I melt the PC/ sample /PC onto the silicon chip, how do I remove both PPC and PC to get the sample?
The process of removing both PPC (photoresist) and PC (protective coating) layers after the reverse dry transfer method involves applying a suitable solvent to the sample to dissolve both layers. After dissolution, the layers are gently removed through rinsing with an appropriate cleaning agent, such as a solvent stream or a soft brush, followed by rinsing with isopropyl alcohol or deionized water. Once dried, the sample is inspected to ensure complete removal of the layers and is ready for further processing or analysis.