I want to deposition thin film on substrate vis spin coater device in nano thickness ,
how can i know the thickness of thin film from speed of spin coater ?
Thanks
Dear Faris Alhamdany
The thickness of a thin film deposited using a spin coater device can be estimated using the following formula:
h = K * (ω^2 * t)^1/2
where h is the thickness of the thin film,
K is a constant that depends on the properties of the material and the solvent used,
ω is the angular velocity of the spin coater, and
t is the deposition time.
The value of K can be estimated experimentally by depositing thin films of known thickness using the same spin coater and solvent and measuring the angular velocity and deposition time. Once the value of K is known, the thickness of future thin films can be estimated using the above formula and the angular velocity and deposition time used.
It's important to note that this formula provides an estimate of the thickness of the thin film, and the actual thickness may vary depending on factors such as the properties of the material and substrate, the solvent used, and the deposition conditions. Therefore, it is recommended to use other techniques such as ellipsometry or profilometry to accurately measure the thickness of thin films deposited using a spin coater.
I agree with Kaushik Shandilya butt it is sometimes tough to calculate. because the viscosity of sol changes during deposition. I recommend PARAV software may help you. Just need the transmittance data of the film.
There is an equation to calculate the thickness of thin film deposition on substrate from spin coater speed. This equation is known as the Landau-Levich equation and it relates the film thickness to the spin speed, the viscosity of the liquid, and the surface tension of the liquid.
The equation is given as:
h = (4/9)(η^2/ρω^2)^1/3 * Rf^(2/3)
where h is the film thickness, η is the viscosity of the liquid, ρ is the density of the liquid, ω is the spin speed, and Rf is the radius of the spinneret.
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