I vote for electroless deposition. It is the easiest of all and at much lower substrate temperature. Evaporation (thermal or e-beam) would be my second choice.
Surface may be damaged prior to coating to enhance adhesion. It can be achieved using low energy heavy ion beams that will induce damage in the desired surface region
you can sputter nickel using an rf magnetron then impregnate them onto the surface of your glass samples... for the optimized parameters there a lot of literature on this, usually you just need to watch out for the temperature of the substrate and the rf power
I just skipped your answer. You say " If you don't want to use galvanic coating". But as far as I know a glass substrate is nonconductor. Then you can not use galvanic coating.
I want to deposit Nickel ions (read again... ions... not nickel metal or electroless nickel etc.) and I want to know if there is a way of depositing them using some solution(s) or liquid(s). Basically it is ok even if the nickel ion is at the end of a functional group or something. I need to use it for something that attaches specifically to nickel ions and not nickel atoms.
@philip: yes, nickel ions on the open side, and a connecting molecule/complex to glass. and ... i dont know about the dip coating process...if it answers my query, please elaborate further
@ Philip : If the nonconductor sample is not treated for metal deposition, it is not possible to coat its surface by galvanic coating. This is why the Pd (or other) seed, or other surface treatments are used.The pre-coated nonconductor surface then can be coated by galvanic process since it is needed to pass the current.through the coated layer on the surface of nonconductor sample for further metal plating.