Chemical Reaction engineering module--------Surface reactions and deposition processes or Plasma module---------------Chemical vapor Deposition 

or you can also use Particle tracing under CFD module.

Dear Abilash,

Up to my knowledge, the modules that you have mentioned may be used when you have chemical reactions at the surface of the substrate, or you have ions that may be guided by electric fields. Others are used for processes that include liquids. I don't know which module can be used to simulate PVD???

hi,

not sure it is possible..  you can simulate a fluid plasma: telling you the ion current on your target surface.  you may include  some sputtering rate equations.  but the real sputtering effect describing each particule trajectory will be difficult to catch: not really a fluid phenomena.    So the particle tracing may help there.

electromagnetic (AC/DC or rf module depending on your plasma excitation), chemical engineering and particle tracing..  i would say.. 

but this will give you cathode usage and particle flows at best...   to get some coating thickness will be more difficult.  the growing of a PVD film is quite different than a CVD one (non-equilibrium), so fluid models also here are not appropriate.

but, carry on..  would be nice.

poeple in U-Ghent are on the best way of simulatingPVD (as far as I know, but I do not know which tools they use).

An open-source tool for plasma is available.

A complete open-tool package similar to Comsol not yet..  (code Elmer or similar are trying their best)

lukas

Dear Lukas,

Many thanks for the information. I think there is a lot of work to do regarding PVD simulation.

Dear Lukas,

I found this paper where the authors had adopted COMSOL to make simulation of PVD process:

http://www.ijari.org/CurrentIssue/2014Volume2/IJARI-ME-14-06-114.pdf

ok, if PVD is thermal evaporation then there is no plasma, no sputtering.. one can probably model some deposition 8like in the paper you found).

JOURNAL OF APPLIED PHYSICS

VOLUME 84, NUMBER 9

1 NOVEMBER 1998

Texture development mechanisms in ion beam assisted deposition

L. Dong and D. J. Srolovitz a)

Department of Materials Science and Engineering, The University of Michigan, Ann Arbor,

Michigan 48109-2136

~Received 19 May 1998; accepted for publication 10 July 1998!

IOP P UBLISHING

J OURNAL OF P HYSICS D: A PPLIED P HYSICS

J. Phys. D: Appl. Phys. 41 (2008) 205307 (6pp)

doi:10.1088/0022-3727/41/20/205307

The metal flux from a rotating cylindrical

magnetron: a Monte Carlo simulation

K Van Aeken, S Mahieu 1 and D Depla

Department of Solid State Sciences, Ghent University, Krijgslaan 281(S1), 9000 Gent, Belgium

E-mail: [email protected]

Received 9 July 2008

Published 2 October 2008

Online at stacks.iop.org/JPhysD/41/205307

Excerpt from the Proceedings of the COMSOL Conference 2009 Boston

Model of a Filament Assisted CVD reactor

Jozef Brcka*

TEL US Holdings, Inc., Technology Development Center

*Corresponding author: 255 Fuller Rd., Albany, NY 12203, [email protected]

this J. Brcka  is Comsol expert.

lukas

Rear Lukas.

Again many thanks for the information.