we have 10 nm SiO2 on 100 nm Al2O3 on a silicon wafer. No matter how I set the fitting model. the ellipsometer always consider SiO2 as the same material to Al2O3.
The fitting result is 110nm Al2O3 instead of 10nm SiO2+100nm Al2O3. What should I do to differentiate SiO2 from Al2O3. The index is 1.44 for SiO2 and 1.65 for Al2O3. Thanks.
Gustavo Henrique de Magalhães Gomes
Dear Jerry
Which software do you use?
I am used to employ CompleteEASE software. You can separate the layers and set the standard Cauchy values for SiO2 employing its model (easily found in internet or research paper), then you fit the Al2O3. After this, try to fit only the SiO2 layers that was locked before.
Hope it works.
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