Since I am working on solid state solar cells, hole transporting layer (~50 nm) has been optimized as an initiative to fabricate a device. Now I would like to take TEM for that layer. Hence i am asking this question to the experts.
Hello Mr Vengatesh!
1) You can off the layer of your film by HF and can go for TEM.
2) You can deposit the film simultaneously on NaCl and Glass/Si Substrate. Film deposited on NaCl crystal can be obtained by dissolving NaCl in double distilled water.
Dear colleague P. Vengatesh
In addition to the good aforementioned comments:
you can merge the glass or Si substrates in a condensed foam Soap and let to be dry,
then you can deposit your film. After the deposition, with angle 30-45 deg carefully and very slowly merge the the substrate after deposition in a distilled water. the films will floats then you can catch on a grid. ( the attached website shows types of TEM grids).
https://www.tedpella.com/grids_html/grids.htm
Dear Professors and Colleagues,
Thanks for the useful information. especially the link given.
Regards
venky
You can contact PSG Institute for HRTEM analysis of your thin film. They will prepare the sample for you by FIB technique.
Hello Mr., the following is the address where you will find the TEM instrument for the analysis.
They will analyze your sample once it is taken on copper grid as mentioned by Dr. A. Eldenglawey in his answer.
Contact me again for analysis help.
Sardar Patel Centre for Science and Technology
Vallabh Vidyanagar – 388120,
Dist: ANAND,
GUJARAT, INDIA
Phone: +91-2692-234966
FAX: +91-2692-238355
E-mail: [email protected]
http://www.sicart.res.in/tem.aspx
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