It is required to measure thicknesses of dielectric layers on top of silicon substrate.
On silicon substrate, TiN thin layer, then SiO2 thin layer and then HfO2 thin layer. All the layers are deposited using spitting technique.
Kindly suggest how to measure thicknesses of all thin layers.
Thanks and regards,
Vinod
UV-Vis based ellipsometry may be able to help.
Jasco has some systems:
https://jascoinc.com/products/spectroscopy/film-thickness-measurement-systems/
I can put you in touch with the application scientist for your region, if you have questions.
TEM can determine the thickness of each layer from your triple stack of dielectric thin films for sure.
Ellipsometry is one of the best way to measure the thickness of such film stack. However, you have to have a model for this film stack.
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