The Hall probe measurement system is not working well, so I was thinking to measure the sheet resistance of the graphene layer with multimeter. The thickness of the graphene layer is around 0.35nm. How can I precisely measure the sheet resistance?
The easiest way to measure the sheet resistance with multimeter is that first just measure the resistance of the deposited material with the multimeter and note it down. Then measure the dimensions (Length and Width) of the deposited material. Then use the following formula
The easiest way to measure the sheet resistance with multimeter is that first just measure the resistance of the deposited material with the multimeter and note it down. Then measure the dimensions (Length and Width) of the deposited material. Then use the following formula
Contacting methods like four-point-probes will always be harmful to the sensitive graphene layer. Non-contact sheet resistance of graphene can be well measured with high frequency eddy-current. https://en.wikipedia.org/wiki/Sheet_resistance#measurement
Is this considering a dc circuit? what happen if you have AC circuit?For example you have a square mesh , will this sheet resistance change with function of frequency? and If so, what will happen to that mesh electromagnetically ?
When using two probe method to measure the resistivity of a thin film you have to take into consideration the flowing precautions:
- The probes must make low resistance ohmic contact with the film
- the geometry of the electrodes must be well defined. The most easier geometry is the stripe geometry comprising the width of the specimen say w.
- Then the thickness and the length L must be known. It is advantageous to make L>> w to make the resistance of the film much greater than the contact resistance with electrodes.
Then one can use the expression for determining the film resistivity roh :
Rf= roh L/ wt
where Rf is the film resistance between the two electrodes and t is the thickness of the film. Rf is directly measured by the ohmeter
It is also assumed that the substrate must insulating.
In order to avoid all these precautions one uses four point probe or the Van der Paw method provided also that the substrate must be insulating.
In case of using four point probe:
If you have the sheet resistance of the film measured by the 4-point probe provided you satisfy all the assumptions of the simplified expression:
Rs= sheet resistance = 4.44 V/I where V is the four point probe voltage and I is it current. The sheet resistance = the resistivity roh/ t the thickness of the film.
To get roh= Rs.t , which is the expression brought by Zainab.
The most important requirement for the validity of the above expression:
-The substrate must insulating
- The extention of the film must be much greater than s the probe spacing
- The probe spacing must be much greater than the film thickness
- The material is homogeneous
For the four point probe measurement you need a known current source and a voltmeter.