I am using photoresist to pattern the graphene. How do I remove photoresist completely from the graphene? And after the removal, how I can be sure that all photoresist has been removed. I would like to reduce as much residual as possible. Thanks.
Its generally not possible to remove 100% residues of photoresist from graphene. Few solutions suggested are: use of photoresist stripper {NMP (1-Methyl-2-pyrrolidon), DMSO (Dimethyl sulfoxide), 2-3 % KOH or NaOH (use carefully)} , heating in N2 at 250C for 2h or forming gas.
Its possible to monitor contamination down to 0.2 nm by Variable Angle Spectroscopic Ellipsometry efficiently.
Off course acetone is the first choise, but as its doing its job 100% other chemicals have been used. Actually, I am not aware of any literature report who can study the exact amount of contamination left by a photoresist and its removal by different solvents. You can see this paper Appl. Phys. Lett.102, 113102 (2013).
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