I want to deposit multilayer coating of germanium and silicon monoxide on silicon wafer using ebeam evaporation?
https://www.google.com/url?q=https://doi.org/10.5442/D0017&sa=U&ved=2ahUKEwjok6vD24zvAhUN1xoKHS9HByoQFjADegQIBxAB&usg=AOvVaw1PsNBvxC5NwB1NCtgbJXgM
You might try reducing the stress between layers, by reducing the deposition rate of the materials.
You may try as well to evaporate the SiOx with an appropriate boat by thermal evaporation.
Increasing the temperature of the substrate during deposition might help as well.
Why not replacing Ge by Si?
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