Hi everyone,
By preparing the solution of the catalyst I prepared from Pt, Pd and C,
I apply a thin layer on the GDL by spraying method. This layer is hydrophobic.
I want to used this layer as a substrate and cover its surface with a layer of TiO2 thin film. I make the TiO2 thin film with the RF sputter method using Ti target and Ar, O2 gases. I successfully obtain TiO2 film with the sputter method.
However, the TiO2 film shows hydrophilic properties and its adhesion is very bad.
In my study, I especially want the TiO2 film to be hydrophobic and to have good adhesion. How can I provide these features with the sputtering method?
Thank you for your help
Dear Yasemin Aykut, if I understood well the scope of your question, I think it is wise the prepare first TiO2 thin film and then modify it hydrophobically. If it is ok, pleinty of references dealing with that are available through simple search. My Regards
TiO2 thin films are deposited on the glass substrates at room temperature by RF magnetron sputtering at an elevated sputtering pressure of 3 Pa. and annealed at different temperatures up to 873°K for 1 h.
Titanium dioxide thin films were deposited on silicon and glass substrates by using direct current (dc) magnetron sputtering system. Thin films were deposited with different O2 gas flow rate.
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