Hi All,
We are doing a CVD process in which vertically aligned CNTs are grown on a Si wafer. The CNTs length is 100-150 um and the wafer is coated with 10 nm Al2O3 and 1.8 nm thick Fe catalyst.
I would like to detach the CNTs from the Si wafer as a free-standing film.
Any suggestions on how to do this will be much appreciated.
Thank you,
Ronen
If the carbon nanotubes are intertwined, then you can try to hold the sample in vapors above the solution of HCl or HCl+HF. Stretch the net or perforated plastic sheet under the plate so that the exfoliated layer does not fall into the solution.
Or use Plasma FIB sample preparation if small area is enough.
Good day, Ronen Verker! Hope you are doing well.
I found another physical way of detaching.
"CNT array was prepared by the two-step floating CVD method ... The as-synthesized, single-layered CNT array was water-etched in the same tube furnace used for its synthesis. The furnace was ramped to 750 °C over 75 min under 500 sccm Ar, then 400 sccm Ar was introduced through a water bubbler for 20 min. The furnace was then cooled to room temperature in 500 sccm Ar. After water etching, the CNT/substrate composite was fixed onto a flat surface using double-sided adhesive. A tube capped with a filtration membrane was placed ∼1 mm above the CNT array, and a vacuum was applied in the tube using a pump. The CNT array was abruptly drawn from the substrate onto the filtration membrane. After the vacuum was stopped, the free-standing CNT array could easily be removed from the filtration membrane."
Please check the following paper for some extra details:
Article Facile Preparation of Free-Standing Carbon Nanotube Arrays P...
Best of luck in your research!
Yours sincerely,
M. Sc. Vadym Chibrikov
Department of Microstructure and Mechanics of Biomaterials
Institute of Agrophysics, Polish Academy of Sciences
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