I fabricated solar cell by using flexible transparent conductive electrode(TCE). silver nanowire is deposited by solution process on the PC and PET.
On the TCE, I coated ZnO ETL layer, PTB7-Th:IEICO-4F solvent chlorobenzene active layer.
Zno layer and active layer should be erased effectively for making electrode alive. I tried to scribble with Hexane, IPA, CB but there were not suitable.
Which solvent or which methods can selectively erase ZnO and active layer while AgNWs alive?
Dear Inkook,
I think the method of subtracting the active layer and the ZnO from the top of the TCE may be not the best method to uncover the cathode contact region.
Since the process is a low temperature process, then you can use Tesaadhesive film to cover the cathode contact area from being deposited by the ZnO and active layer. After finishing the deposition you can strip the adhesive film from the intended area.
Best wishes
Dear Inkook,
Further our colleague Abdelhalim's comments, ZnO coating is very hard to remove regardless solution processed or thermal evaporated films. The best way is to mask the electrode area before doing ZnO coating. Organic layers you referred to active layer can be removed by solvents such as CB or DCB or chloroform. Hope it helps.
Xuhua
Xuhua Wang Mask can be used for spin coating? I never have been thought this idea. Could you teach me the method in detail?
Dear Inkook
You can use mask tapes to cover the electrode area to avoid the ZnO coating. The tape should be solvent or heat resistant and can be removed after device fabrication coating done. Hope it helps.
Xuhua
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