Hi,

I am growing PdTe2 by direct tellurization of Pd films on quartz substrate by CVD process. The Pd films are pre-deposited on the quartz substrate using E-beam evaporator. The roughness of deposited Pd films in Pico meter. Te is in powdered form.

However after the reaction and formation of PdTe2, the film roughness is coming around 10 nm which very high for my application.

I have downed the growth temperature, gas flow but up to a certain limit as beyond that the material is not growing.

Please suggest how can I improve the roughness of films.

Thank you in advance.

Regards

Pinki