Greetings, this is my first research project regarding PVD deposition of AZO (Aluminium Doped, Zinc Oxide) on a glass substrate. However, having the option of doing Plasma cleaning in both environments I am confused as to which I should pursue.
My research partners put heavy emphasis upon this step before the PVD, hence I am concerned about this.
My Hypothesis is that the oxygen environment is better, as it will better remove all the oil and organic contaminants more effectively without oxidizing the substrate.
Hi,
The choice of the process gas depends on the type of contamination, but also the type of plasma (discharge mode, pressure etc.).
I fully agree with you that organic contaminants can be efficiently removed by oxygen-containing plasmas...since surface-adherent hydrocarbons are oxidised to H2O and CO2. The surface will most likely not be oxidised since glasses consist of oxides (however, there is also the possibility or risk of implanting oxygen into a glass network).
Inert gases with a certain oxygen admixture are quite powerful for cleaning purposes since e.g. argon has a low discharge threshold and may increase the efficiency of the plasma cleaning process, also by additional plasma-physical mechanisms and UV-irradiation.
I hope this helps,
Best wishes,
Christoph
Hi Mohammad,
good question. I found surprising results some decades ago on soda -lime glass. Oxygen plasma makes sense to remove organic contamination from the surface and argon may also help.The surprise came up in the XPS/ESCA when the Na-, K- and also Ca- and Al- signals were found to change intensity. Luckyly, the corrosion resistance was improved by the Ar plasma treatment. For further details, please search in the patent and other lopen literature or contact me via my company home page. My health keeps me from digging deeper, now.
Best wishes,
Heinrich
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