I have PMMA pattern on top of monolayer MoS2. Can I use Oxygen plasma Reactive ion etching system to selectively etch exposed portions of MoS2
This shoul help you:
http://iopscience.iop.org/0960-1317/14/5/001/pdf/jmm4_5_001.pdf
If I understand the question correctly - you're looking to etch MoS2 film with a PMMA mask in an O2 plasma.
PMMA etch rates in oxygen are very high.
I wouldn't expect oxygen plasma to etch MoS2 very well - typically use F-based chemistries for Mo containing materials.
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