Can I use PMMA as a mask to etch MoS2 using oxygen plasma etching?

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Jacek Gryglewicz

This shoul help you:

http://iopscience.iop.org/0960-1317/14/5/001/pdf/jmm4_5_001.pdf

Russ Westerman

If I understand the question correctly - you're looking to etch MoS2 film with a PMMA mask in an O2 plasma.

PMMA etch rates in oxygen are very high.

I wouldn't expect oxygen plasma to etch MoS2 very well - typically use F-based chemistries for Mo containing materials.