2 Questions 18 Answers 0 Followers
Questions related from Srikanth Ammu
I have PMMA pattern on top of monolayer MoS2. Can I use Oxygen plasma Reactive ion etching system to selectively etch exposed portions of MoS2
11 April 2015 7,173 2 View
I have a Si mold with 5:3, 15:6 dia:depth ratio for microstamp. Upon peeling the 15:7 peels off without any issue, but the 5:3 (100micron dia and 60 micron depth) upon peeling all the pillar like...
16 January 2015 9,480 17 View