Hello everyone,

I would like to know if a cross-linked SU-8 (2002 to 2010) photoresist is anyhow soluble in solvent like acetonitrile after development and hard bake? The documents I have read about it always stated that it is very difficult to remove the cross-linked photoresist using conventional solvents.

The material under the photoresist happens to be Pt.

Thank you in advance for your expert opinion.

Best regards,

Marie B.

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