Hello everyone,
I would like to know if a cross-linked SU-8 (2002 to 2010) photoresist is anyhow soluble in solvent like acetonitrile after development and hard bake? The documents I have read about it always stated that it is very difficult to remove the cross-linked photoresist using conventional solvents.
The material under the photoresist happens to be Pt.
Thank you in advance for your expert opinion.
Best regards,
Marie B.