Work Function of Al2O3 deposited using ALD at temperature 200 degree C?

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Rémi Rafael

Dear Muhammad Aleem Zahid

In my experience predicting with precision the EWF of Al2O3 with precision is a difficult task as it can be impacted by various process parameters.

You should also expect a small variation depending on the thinness due in part to a different density of defects (charge traps) at the interfaces.

Depending on the phenomenon you are investigating you may also have to account for the Schottky effect.

I believe this article could be of use to you:

Article Highly transparent low capacitance plasma enhanced atomic la...

Len Leonid Mizrah

Dear Muhammad Aleem Zahid,

See the results at the following links:

https://www.researchgate.net/publication/287840575_Large_scaled_atomic_layer_deposition_reactor_for_Al2O_3_in_FPD_applications

https://apps.dtic.mil/sti/pdfs/AD1116861.pdf

Saad Zahraw Sekhi

I agree with Rémi Rafael.