1) Can anyone tell me the work function of Al2O3 deposited using the ALD system at temperature 200 oC? The thickness of the Al2O3 layer is ~80nm...
2) Is work Function also dependant on the thickness of the layer?
Dear Muhammad Aleem Zahid
In my experience predicting with precision the EWF of Al2O3 with precision is a difficult task as it can be impacted by various process parameters.
You should also expect a small variation depending on the thinness due in part to a different density of defects (charge traps) at the interfaces.
Depending on the phenomenon you are investigating you may also have to account for the Schottky effect.
I believe this article could be of use to you:
Article Highly transparent low capacitance plasma enhanced atomic la...
Dear Muhammad Aleem Zahid,
See the results at the following links:
https://www.researchgate.net/publication/287840575_Large_scaled_atomic_layer_deposition_reactor_for_Al2O_3_in_FPD_applications
https://www.researchgate.net/publication/287840575_Large_scaled_atomic_layer_deposition_reactor_for_Al2O_3_in_FPD_applications
https://apps.dtic.mil/sti/pdfs/AD1116861.pdf
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