I have try to prepare Ni doped ZnO thin film by sol-gel spin coating method. In this work, dopant concentration increased from 0 to 0.6, intensity of diffraction peak increases and well crystalline nature was observed. But 0.8 concentration, the film fully amorphous state, and again increases the concentration to 1.0, the diffraction pattern become crystalline nature. So what is the main thing behind this crystalline changes while increasing the concentration. Any body suggest this question.
You have prepared the sol with 0.6 or 0.8 or 1.0 % Ni doping.
But are you confirmed whether the same Ni is present in your film??
In general we always get less dopant in film than sol, used to prepare the film.
You can try EDAX or XPS to confirm dopant concentration.
If possible repeat the expt. for some times to cross check if that is due to dirrerent expt. condition.
Best of luck.
It is usually obtained by high doping concentration in ZnO thin film and it makes inconsistent results. It may be caused by limitation of Ni ion in ZnO structure or there are defects in ZnO crystal after high doping that reduce the crystallinity of the film.
Have you ever repeated the spin coating process? The 0.8 Ni doped ZnO still has the same result?
Hi,
Did you repeat the experiment with Ni 0.8 % doping and also repeat the XRD measurements on different positions on the sample??
I think it's really necessary to repeat the experiment at 0.8 % doping if the XRD result gives same result like before. You may also try AFM, SEM and EBSD to understand the grains and grain boundaries, and its chemical composition.
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