Hello,

Maybe you have a deposit but thin enough that you don't see it: you should try to deposit longer and on a substrate other than glass (without Si) and then do an EDS analysis to check that you have deposited Si.

Gilles Poullain Thank you for your response Sir , I will try this.

May be you realize deposition of SiO2 not Si?

As per my knowledge, deposition power and pressure also influence the film thickness, microstructure. if the too much low and high deposition pressure also reduce the film thickness and some times may not form the film. depending on your system configuration, you need to use the optimized conditions.

Yuriy Kudriavtsev Sir , I am not giving any oxygen supply in the system. Is it due to glass substrate you are saying that SiO2 might have been deposited ???

The substrate still looks transparent.

@

Angel G. Rodriguez

Thank you for your response , but I am using a fresh Si target can I increase the power so much. how do I differentiate that inspite of plasma been visible the issue is in substrate deposition or target sputtering.

Dhananjaya Munthala

Thank you for your response , I shall check.

Your ultimate vacuum is not very low and it is likely that there is still some oxygen in your deposition chamber so that you probably deposit SiOx which could be transparent, that is why I recommended in my first answer to check the presence of Si by an EDS analysis after a deposition on a substrate without Si.

Sutapa, As Dr. Poullain said, your vacuum level is no so good. I can remember, that at 1e-6 torr you have adsorption of one ML of residual molecules per second.

If you have in your residual atmosphere H2O, you receive SiO film during Si deposition...

In order to test the deposition process you can use a mask to cover a part of the substrate and to see after the deposition if a step is forming.

Following

try to use dc mode and high power...