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Questions related from Sutapa Badyakar
I am trying to deposit a thin film of hydrogenated amorphous silicon by RF magnetron sputtering.
30 June 2023 1,064 3 View
I have DI water, HF solution, acetone, isopropyl alcohol and ultrasonic cleaner
06 June 2023 5,330 1 View
I have 3 substrates p-si (0.001-0.01 ohm cm), n-si (1-10 ohm cm) and glass. When I use si wafer as a substrate during RF sputtering I have noticed that the edges are not coated and coating is...
06 June 2023 6,899 4 View
The negative bias is connected to one substrate. The other substrates are not connected to any bias but place nearby to the biased samples. Will this work in a RF sputtering chamber?
06 June 2023 7,193 0 View
trying to find out hydrogen concentration in a thin film deposited on glass.
17 November 2021 1,884 3 View
If you suggest this equation then please let me know how to calculate the values of alpha and alpha0 for thin films only. alpha=alpha0*e^(hu/Eu)
17 August 2021 162 5 View
Argon and hydrogen pressure should be 2* 10^-3mbar. Trying for an a-Si:H coating.
30 July 2021 5,386 3 View
What are the formulas to be set in the columns to get hu vs (ahu)^2? if any book name is provided, will be great.
29 July 2021 395 4 View
Hi All , I am using a fresh Silicon target (dia 2 inch and 6mm thickness 99.99%pure ). The base pressure of the system before gas flow is 10^-5 mbar and the Ar mass flow sccm value is set to 20....
07 December 2019 7,721 10 View