10 Questions 8 Answers 0 Followers
Questions related from Sutapa Badyakar
I am trying to deposit a thin film of hydrogenated amorphous silicon by RF magnetron sputtering.
30 June 2023 1,085 3 View
I have DI water, HF solution, acetone, isopropyl alcohol and ultrasonic cleaner
06 June 2023 5,348 1 View
I have 3 substrates p-si (0.001-0.01 ohm cm), n-si (1-10 ohm cm) and glass. When I use si wafer as a substrate during RF sputtering I have noticed that the edges are not coated and coating is...
06 June 2023 6,915 4 View
The negative bias is connected to one substrate. The other substrates are not connected to any bias but place nearby to the biased samples. Will this work in a RF sputtering chamber?
06 June 2023 7,212 0 View
trying to find out hydrogen concentration in a thin film deposited on glass.
17 November 2021 1,903 3 View
If you suggest this equation then please let me know how to calculate the values of alpha and alpha0 for thin films only. alpha=alpha0*e^(hu/Eu)
17 August 2021 174 5 View
Argon and hydrogen pressure should be 2* 10^-3mbar. Trying for an a-Si:H coating.
30 July 2021 5,398 3 View
What are the formulas to be set in the columns to get hu vs (ahu)^2? if any book name is provided, will be great.
29 July 2021 408 4 View
The configuration in target is below the substrate and the chiller water temperature doesn't go below 20 deg C. And please let me know how exactly the power density is calculated?
26 July 2021 7,928 3 View
Hi All , I am using a fresh Silicon target (dia 2 inch and 6mm thickness 99.99%pure ). The base pressure of the system before gas flow is 10^-5 mbar and the Ar mass flow sccm value is set to 20....
07 December 2019 7,732 10 View