I have deposited CuO thin films on Stainless Steel substrate (S.S) by RF Sputtering at different two temperatures and the thickness of the as-deposited thin film is about 400 nm also which was confirmed through XRD analysis. Herewith my doubt is as-deposited CuO thin film was used for electrochemical studies (Cyclic Voltammetry and Impedance analysis) and the CuO thin films is suddenly dissolving with 1, 2, 5 and 6M KOH electrolyte solution. In journal papers, most of the authors report that using of higher concentration electrolyte will give the good results ( like 6 M KOH electrolyte) for CuO thin film electrodes, but in my case, I used to analyse the electrochemical properties for my deposited CuO thin films with 6M KOH electrolyte the CuO films was dissolved and damaged. Kindly give your suggestions for my above-mentioned question.
Hi Durai,
What color were the films, if such observation was possible? And what kind of procedure was used for deposition?
Dear Sir,
The colour of the film is black.
RF sputtering system (physical vapour deposition) is used for deposition at substrate temperature of room temperature and 400 deg.C.
deposition time is 60minutes.
film thickness was measured by Dektak Stylus profilers instrument.
And one more question, the deposition process was in vacuum? The deposit completely dissolved or dropped down into the cell?
In my thinking, you deposit a mixture of Cu + CuO or pure Cu ( fine powder of Cu is black also). Then you dissolve copper under anodic polarization. It is only one rationale.
Dear Valeri Kotak,
All the Experiments I have done in high vacuum condition only with Cu metal target using RF Magnetron Sputtering deposition system, herewith, the constant Argon and Oxygen gas ratio have been supplied to form CuO thin films. Hence The as-deposited film was confirmed from XRD analysis.
Dear Prof. Susheel Mittal,
First of all, thank you for answering my question. In research articles Authors were mentioned at higher concentration of KOH electrolyte is giving better results compared to lower concentration KOH electrolyte to analyze electrochemical properties of CuO thin films herewith I have attached two papers which have detailed studies about electrochemical studies on CuO thin films and its electrochemical properties. Kindly see the attachment, sir.
Dear Prof. Susheel Mittal,
I will do as per your suggestions and I will do with the lower concentration of (0.1M) KOH electrolyte solution, then I will inform to you sir.
Thanks and Regards
Durai.G
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