I'm trying to obtain a layer of Nickel Silicide in the 50:50 phase by diffusing a thin layer of evaporated Ni on a 100 oriented Si wafer.

I have been able to obtain the supposedly metastable phase Ni2Si (composition evaluated with XPS) but even after 30 min annealing at 350°C the silicide is not converted in stoichiometric NiSi, contrary to what is pointed out in the literature I have found. Does anyone have suggestions?

Thanks in advance

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