Dear Majibul Babu,
In complement to the previous answers, I would add that it really depends on what you want to do. Do you need thin films for facet coatings of devices? Do you want the deposition technique to be used to cover large wafers? What materials do you want to deposit? (i.e. hydrogenated a-Si would require a CVD method) Will there be any limitation in the deposition temperature? How accurate will the thickness of the films need to be?
Many good techniques are available, but you need to define more precisely your requirements.
dear Majibul Babu,
you must select the material firstly to determine the suitable technique.
Best regards
Dear Majibul Babu,
In complement to the previous answers, I would add that it really depends on what you want to do. Do you need thin films for facet coatings of devices? Do you want the deposition technique to be used to cover large wafers? What materials do you want to deposit? (i.e. hydrogenated a-Si would require a CVD method) Will there be any limitation in the deposition temperature? How accurate will the thickness of the films need to be?
Many good techniques are available, but you need to define more precisely your requirements.
Hi Babu,
What is your material. How much thickness you want to deposit.
Better you can go for PLD or UHV.
Wish you good luck.
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