I want to clean the glass surfaces for surface modification analysis, therefore i am exploring various glass cleaning protocols for the maximum possible decontamination. ( Organic, inorganic and oxide complexes)
I suggest a triple organic process and following a thermal shock heating several times in UHV. First 5 min ultrasonic at 60 degrees with methanol puriss. then the same with acetone puriss. and after that with isopropanol puriss. Then carefully clean with anionic filtered water and blow dry with N2 of purity 5.0. Do all this in a flow box. I recommand a connected UHV aparature with the possibilitx for a sample heating for the last step to get rid of the oxid and H2 from the substrate .
Degas the glas slide for 8h at 650 degrees. Pressure below e-9.After that flash to 1200 degrees for more and more seconds several times until pressure stays below e-9 for approx 15 sec. Then slowly cool down.
Pay attention the slide may break during the shock heating. You have to be patient but your sample surface is very clean and well reconstructed on the atomic scale if you use a really flat slide