I had a Galfenol (Fe:Ga, 81:19 %at.) target made for sputtering, when I received the target I sent it for an EDX analysis and the results came back as Fe:Ga:C (60:11:29 %at)
I am curious about other people's experience with this type of target (or perhaps Fe), is this what one would typically see for the EDX and the C content ignored as a surface contaminant?And is a long pre-sputter time just used to ensure clearing of the C? And I am aware that the EDX itself can be the source of C in the readings.
Or do I have a questionable target?
The follow up would be the films, to ensure that they do not end up being a ternary FeGaC alloy.