Dear Kothari,

Thank you very much.

I have another question. What's the polysilicon etchant?

Dear Kothari, thank you very much.

It's helpful.

Dear Kothari, I have a question about the polysilicon etchant.

I have found that the etching rate for Si(100) was over 30 nm/min with Ni as a electrode on Si. It's possible that Ni played the role of a catalyzer.

Silicon etchants without HF are advisable to avoid etching SiO2. You may consider: HNO3 + H2O2 aqueous solution (aq.); HCl + HNO3 (aqua regia); KOH aq. + (I2, Br2, KClO3, or K2Cr2O7 aq.); NaOH aq. + (I2, Br2, NaClO3, or Na2Cr2O7·2H2O aq.); glacial acetic acid + Br2 or Na2Cr2O7·2H2O.

Dear Queiroz,

Thank you for your suggestion.