I want to use copper as sacrificial layer in multilayer UV-LIGA process. What kind of etching chemistry should be used to remove copper without affecting nickel structure ?
You may selectively etch Cu with regards to Ni with freshly prepared aq. sol. of ammonium persulfate (20―40 wt%), with added NiSO4 (sat.), and slightly acidified with 1 drop of conc. sulfuric acid. Etching may proceed in cold solution or at room temperature, and should be not prolonged beyond necessary; say, for more than about 10―30 min.