I have a doubt, regarding XRD analysis, recently I have prepared a metal nitride thin film sample and analysed the structural properties using XRD instrumentation. From the XRD analysis I got only 2 peaks for my thin film samples (tetragonal phase). Regarding this, can you explain what are the reasons for the above question.
In thin films crystallite planes get align in some preferred orientations,therefore, reflections are less in XRD patterns or textured pattern is obtained. In your case may be preferred orientation is more.
As already mentioned in the above comment, texture can be a reason. Moreover, if film has nano level thickness then due to very small interaction vol. you can observe low intensity.
Totally agree with previous comment, texturation of your film would certainly be the reason. What is your substrate?
Try to perfomed detexturation XRD measurements.
Regards,
Emile HAYE
Dear Haye,
thank you for the answer,
Here I have deposited on Silicon substrate and also there is no prepared orientation in the deposited films, major intensity peak is there and 2nd peak only shifted towards higher angle side.
Kindly give me clear reasons.
Dear Prof. A.S. Yadav,
Thank you for u r answer. And also i gave few points in last massage, please read and send the possible reasons.
Dear Prof. U.A. Palikundwar
Thank you for u r answer. And also i gave few points in last massage, please read and send the possible reasons.
The reason for the peak shifting are the change in lattice parameter, residual stresses and measurement errors. According to me the most possible reason is that 'c' axis of your crystal has a different dimension than that you are referring (database). i.e. your c/a ratio is less than you expected.
Along with the above reasons, I believe there is another two parameters which leads to missing peaks as i have experienced. First one is the scan speed and second one is the angle on incidence. Both could be the reason for the above mentioned anomaly.
Hope it helps.
Regards,
Nagabhushan J Choudhari
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