The difference between amorphous silicon(a-Si) and Hydrogenated amorphous silicon(a-Si:H) in terms of cost and ease of fabrication is probably that the first Si was rapidly cooled in a vaccum environment(condition)and the former Si was rapidly cooled in an aerated (in the present of H2)environment. In addition, the first Si would cost more to fabricate in acomparison to the former Si.
amorphous silicon can be deposited by thermal evaporation of pure silicon - cheaper process. However hydrogenated amorphous silicon is commonly deposited by PECVD technique (expensive process). Hydrogenated a-Si:H deposited by PECVD is extensively used in industries. Defects are minimised due to passivisation by hydrogen, hence quality is better. However both suffer from stability. PECVD process is expensive and also dangerous due to use of gases and expensive to maintain the instrument.
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