Hi.
I am doing research on 2D material (Graphene, MoS2 etc) based FETs.
After metal deposition and lift-off, many many black dots are randomly scattered on the surface of metal electrodes (see attached file).
I don't know what they are, where they are from, and how to remove them.
My experimental process as follows:
1. Prepare channel materials on SiO2/Si
2. PMMA A6 spin-coating for E beam lithography
3. Post bake 120C/2 min on hot plate
4. perform E beam lithography for contact patterning
5. development with MIBK
6. contact electrode deposition with e-beam evaporator (low 10^-6 torr)
7. lift-off with warm acetone (~60C)
Thank you.
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