Problems associated with large-scale pattern growth of graphene constitute one of the main obstacles to using this material in device applications.
1. Transfer
2. Transfer
3. Transfer
Unlike conventional thin-film materials, so far, it is not possible to directly deposit graphene on the substrate of interest. Graphene has to be prepared or grown and transferred. This transfer process is the cause of all bad things. Transfer is done manually. So you need someone with exceptional handling skills. Patterning...Oxygen plasma patterning deteriorates the graphene quality. Photolithography...Very difficulty to remove polymeric residues.
1. Transfer
2. Transfer
3. Transfer
Unlike conventional thin-film materials, so far, it is not possible to directly deposit graphene on the substrate of interest. Graphene has to be prepared or grown and transferred. This transfer process is the cause of all bad things. Transfer is done manually. So you need someone with exceptional handling skills. Patterning...Oxygen plasma patterning deteriorates the graphene quality. Photolithography...Very difficulty to remove polymeric residues.
Yes, i agree with Jaehyun Moon....transferring the graphene thin layers from one platform to another is the most critical task, which not only can contain the environmental residues but also the shape and structures are deformed. The other techniques like sputtering, photo lithography etc. are so sophisticated and expensive which can not be utilized for commercial scales.
I think, with large-scale pattern growth of graphene the number of defects tend to increase due to deformation in the shape and molecular structure and hence the deviation from the properties.
The other things such as experimental setup and economics are also significant.
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