Mono layer Graphene was formed on Cu thin film by using CVD method. PMMA solution deposition process follow, steps on spin coating + heating. But at the end of the process the PMMA layer was broken before the graphene transfer. If any one familiar with this plz comment.
Spin coat with PMMA at 4200 rpm for 50 sec and bake it 60°C for 10 min
By my experience, I don't recommend baking the PMMA on your graphene as it leaves huge residues on graphene once you remove the PMMA. We spin coat 150nm thick PMMA, let it sit for 1 hour before etching. What kind of etchant do you use?
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I think breaking of polymer film is not related to the slight variation in the parameters used to deposit PMMA on top of graphene/Cu foil. I have tried spin coating PMMA from 2KRPM to 4KPRM for 45 sec and annealing at 60-130 C for 10 min, and every time I had perfect PMMA/graphene film floating on top of Cu etchant solution.
See the question asked by Dushyant Tomer, as he is facing the same problem and other people have suggested few possibilities.
Good luck !
I think the time parameter is very important and whose can affect the film preparation. Fine film takes long time (deposited slowly) or ruphness film if rapidly deposietd (in short time).
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