If I deposited amorphous silicon film, the substrate temperature is120°C on polyimide, PET or Corning glass then can we anneal at 120°C for a temperature dependent electrical conductivity (I-V) measurement?
Limit for the substrat temperature has to be taken care of. You can not heat PET beyond 200°C or little more depending upon make/type of PET. This info can be asked from the furnisher/vendor. For Glass, you can go upto 450°C (500°C is the limit boiling point for glass). For Quartz substrat you can go up to 900 or even 1000°C.
I use glass and quartz substrates and did annealing on above temperatures.