I am trying to achieve a planar coating of photoresist through high aspect ratio pillar arrays. These arrays have a height of ~8um, a diameter of 1um, and a space of 1um. What I am finding is a very poor resist coat with areas of the array filling in like between the pillars like a resist maniscus, while nearby areas have little to no coating.
I have tried to edit the spin speeds with no avail, any suggestions?
Attached below is a corresponding SEM.
Thanks!
Matthew Hartensveld One thing to try is to dilute the resist in order to reduce the viscosity. You're trying to make water flow around skyscrapers in a city as one analogy - and this isn't easy.
Further Alan's suggestion, you could use a blade coating method instead of spin-coating for such microstructure surface.
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