28 December 2023 0 4K Report

Recently, I have been performing TiN etching using ICP RIE.

However, I have encountered a problem in the process. Figure 1 depicts the maN-2403 PR after e-beam lithography, with a believed width of around 150nm. However, after ICP etching, it appears that the PR no longer exists, leading to the unintended etching of the TiN layer beneath it.

Can anyone provide some advice?

The ICP recipe I am using consists of 40/160 sccm of CF4/Ar, and the ICP time is set to 120 seconds.

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