May I ask which method is suitable for silicon nanowire assembly and orientation on hafnium oxide. I am mentioning three different technique please tell me which one is best.
1. fluid flow method(please let me know what set-up required and cost of set up establishment.
2. Langmuir Blodgett Systems (I have price for this quotation)
3. Photo lithography(what set up required for this what is the cost of this equipment).
Please if any other method tell me which will be cost effective.
Thank you in advance to all the learned researcher who may help me.
If you want SiNWs on Si wafer then it is very easy and cost effective and does not require any big instrument. Please see the reference attached
Etching is not useful in our case because nanowire needed on the oxide surface
If you want to form silicon nano wires on hafnium oxide then you have to deposit gold in form of statistical dots on the surface of the HfO. These dots will be the preferable seed sites of the deposited silicon from the gas phase. Then you deposit silicon from the gas phase by low pressure chemical vapor deposition using silane gas SiH4 mixed with hydrogen as a carrier gas or an other inert gas. When the silane is decomposed and silicon is deposited it will be collected by the gold forming silicon seeds where the continued silicon deposition will grow the seeds vertically forming Si wires.This method is called Gas- Liquid- Solid GLS [1]
The other method is the etching method of an existing continuous silicon layer
where one deposits continuous silicon layer on HfO and then shape it by etching in form of nanowires.
The last method results in a uniform nanowire structures.
In both methods mentioned here one can use low pressure chemical vapor deposition apparatus.
[1]https://pdfs.semanticscholar.org/68c8/bbfd8d4525e98927ca249afdb51e93f7899b.pdf
Do you have physical deposition techniques like evaporation? So you can evaporate silicon in an evaporator instead of using CVD as a source of silicon.
To your knowledge, Low pressure chemical vapor deposition can be run in a conventional furnace that is used for diffusion and oxidation.
You need to close a one stage vacuum pump at the outlet of the quartz reactor tube.
Best wishes
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