29 October 2017 3 4K Report

I am trying to develop a pattern on GaAs layer deposited on InP substrate by lift off process.

Apparently lift off process didn't work.

I want to remove the metals (Ti:20 nm, Gold 150 nm/Cr:50 nm) from the substrate (GaAs/InP).

Is there a way to do this (through wet etching?)

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