7 Questions 3 Answers 0 Followers
Questions related from Navid Jahed
Both for 1330 nm and 1550 nm
03 July 2021 4,451 2 View
Which one is better regarding loss, stress, roughness for photonic and optical applications at 1330 nm and 1550 nm wavelengths.
03 July 2021 3,721 1 View
I have deposited Ti/Au Cr metal layer (Cr being the last layer) on LT-GaAs substrate. now that I want to perform lithography, the photoresist (nlof 2035) has low adhesion to the underlying Cr and...
17 January 2019 7,720 3 View
I have etched InAlAs/InGaAs film on semi-insulator InP substrate. In fact I am making some devices which active area is doped InAlAs/InGaAs. I need to etch through the devices till I get to Si-INP...
11 December 2017 4,994 5 View
I am trying to develop a pattern on GaAs layer deposited on InP substrate by lift off process. Apparently lift off process didn't work. I want to remove the metals (Ti:20 nm, Gold 150 nm/Cr:50 nm)...
29 October 2017 3,532 3 View
What is the reason when illuminated current does not follow dark current at voltages above Voc? This is also the case for QD-heterojunction solar cells.
01 April 2016 9,000 2 View
I have CdSe/Zns and CdSe QDs. The ligand is OA (Oliec Acid) and the QDs are dispersed in nonpolar solvant (like: Hexane,chloroform) I want to form QD layer (up to 200nm) on the surface of ZnO...
25 August 2015 8,443 4 View
