Can anyone share your experience in good negative photoresist and resist stripper?
Negative resist: Thinkness more than 1.5 um, resolution better than 3 um, and UV exposure (i, g-line).
Dear Chee-Wei-Lee, I have good experience with SU8 negative photoresist. The resist is available in different viscosities for a broad range of thicknesses with good resolution. However this depends on the aspect ratio of your structures. Stripping of the resist however can be difficult when it is fully cross linked. If you need more information feel free to contact me.
Dear Chee-Wei-Lee, I have good experience with SU8 negative photoresist. The resist is available in different viscosities for a broad range of thicknesses with good resolution. However this depends on the aspect ratio of your structures. Stripping of the resist however can be difficult when it is fully cross linked. If you need more information feel free to contact me.
Thanks Daniel. I am aware of SU8, but just that the difficulty in stripping the resist could be a problem for us.
Hello Chee-Wei Lee,
Like Daniel, my first suggestion would have been SU-8 (FYI, easily diluted with cyclopentanone to obtain thinner films).
The other good negative tone resist I use is the AZ nLOF range (for lift-off):
in 2, 3.5 and 7 um
http://www.microchemicals.com/products/photoresists/az_nlof_2020.html
I use the AZ 826 MIF developer. NMP works well for removal.
Kind regards,
Jules
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