Hello,
Due to my research, I want to release a patterned photoresist mold (for PDMS molding) from a Si-wafer. Unfortunatly, the photoresist is highly senstive to organic solvents.
During my research, I found that PVA (Polyvinyl alcohol) can be used for a water-based photoresist film release. Does anyone have a recipe for a PVA-film application for a sacrificial layer?