Hello,
I am currently working with a Trion Orion PECVD system for coating nitride on a silicon substrate. However, I am encountering a recurring issue where a showerhead pattern appears on the film after completing the deposition process.
To address this problem, I have manually cleaned the showerhead, and while this temporarily resolves the issue for one or two runs, it eventually reoccurs. Below, I have outlined the details of my cleaning recipe:
Cleaning Recipe Details:
- Pressure: 800mT
- RF ICP: 300W
- Temperature: 350°C
- NF3 Gas Flow: 30sccms
- He Gas Flow: 145sccms
It's worth noting that the tool does not have CF4 as a gas option.
For the nitride deposition process, the details are as follows:
Nitride Recipe Details:
- Pressure: 1200mT
- RF ICP: 50W
- Temperature: 350°C
- NH3 Gas Flow: 36sccms
- SiH4 Gas Flow: 16sccms
- N2 Gas Flow: 200sccms
Additionally, I maintain the cleaning time at the same duration as the deposition time.
I would appreciate any insights or suggestions you may have to help address this persistent issue. Thank you in advance for your assistance.
Dear friend Mohammed Omar
Hey there! So, the Trion Orion PECVD system giving you Mohammed Omar a bit of trouble, huh? Let's dive into this persistent showerhead pattern issue. Now, I am ready to stir things up, and I've got some ideas for you Mohammed Omar:
1. **Gas Flow Optimization:** You Mohammed Omar might want to play around with the gas flows during both cleaning and deposition. Tweak the ratios, perhaps try adjusting the NF3 flow during cleaning or modifying the NH3/SiH4 ratio during deposition. It's a bit of an art, finding that sweet spot.
2. **Extended Cleaning:** Since you've mentioned that the issue comes back after a couple of runs, consider extending the cleaning time or increasing the frequency of your cleaning cycles. Sometimes, persistence is key.
3. **Alternative Cleaning Gases:** Given that CF4 is not an option, you Mohammed Omar might explore alternative cleaning gases. Oxygen (O2) or a mix with O2 could potentially aid in cleaning, but be cautious as it can be reactive.
4. **Temperature Variations:** Adjust the cleaning temperature. A higher temperature might help in more thorough cleaning, but too high could also risk damaging the equipment, so tread carefully.
5. **Chamber Conditioning:** Prior to deposition, you Mohammed Omar could try a brief chamber conditioning step. Essentially, run the cleaning process for a short duration before starting the nitride deposition. This might help in having a cleaner starting point for your deposition.
6. **Collaboration with Tech Support:** If this issue persists, reaching out to Trion's technical support could be beneficial. They might have insights or recommendations specific to your equipment model or might be aware of any common issues.
Remember, I am diving deep into the realms of suggestions here. These ideas are not guaranteed fixes, but they might just help you Mohammed Omar crack the code on that pesky showerhead pattern issue. Keep experimenting, my friend Mohammed Omar!
Encountering a persistent showerhead pattern on your nitride coating after using a Trion Orion PECVD system can be frustrating. This phenomenon indicates non-uniformity in the deposition process, potentially impacting the film's properties and device performance. Let's delve into the possible causes and solutions:
Possible Causes:
- Gas flow non-uniformity: Inconsistent gas flow through the showerhead can lead to localized variations in precursor concentration and deposition rate, resulting in the pattern. This could be due to:Clogged showerhead nozzles: Blockages can disrupt the flow pattern, creating areas with higher or lower gas flow. Faulty gas distribution plate: The plate might have defects or improper alignment, causing uneven gas distribution across the showerhead. Leakage in the gas lines: Leaks can alter the intended flow pattern and create localized pressure or concentration variations.
- Plasma non-uniformity: Uneven plasma distribution within the chamber can also cause showerhead patterns. This might be due to:Improper RF electrode or coil alignment: Misalignment can lead to non-uniform plasma generation and bombardment across the substrate. Shield issues: Damaged or misaligned shields around the electrodes can affect plasma confinement and uniformity. Process parameters: Inappropriate RF power, frequency, or pressure can lead to non-uniform plasma characteristics.
- Substrate factors: In some cases, the substrate itself can contribute to the pattern. This could be due to:Uneven surface topography: Roughness or protrusions on the substrate can influence gas flow and plasma interaction, leading to non-uniform deposition. Contamination: Pre-existing contaminants on the substrate can react with the precursors and affect the local deposition rate.
Solutions:
- Thorough system inspection: Begin by visually inspecting the showerhead for blockages or damage. Check the gas distribution plate and gas lines for leaks.
- Plasma uniformity assessment: Tools like optical emission spectroscopy (OES) can help visualize the plasma distribution within the chamber and identify any non-uniformities.
- Process parameter optimization: Adjust RF power, frequency, pressure, and other process parameters within their allowable ranges to potentially improve plasma and gas flow uniformity.
- Substrate pre-treatment: Implement thorough cleaning and pre-treatment procedures to ensure a clean and uniform substrate surface.
- Consult Trion support: Don't hesitate to contact Trion technical support for assistance. They have extensive experience with the Orion PECVD system and can offer specific troubleshooting guidance based on your situation.
Additional Tips:
- Document your observations: Clearly document the appearance of the showerhead pattern, including its size, shape, and location on the substrate. This information will be valuable for troubleshooting and identifying the root cause.
- Run test depositions: Perform test depositions with variations in process parameters or chamber configurations to isolate the potential cause and optimize the process.
- Monitor film properties: Analyze the deposited nitride films for thickness, uniformity, and other relevant properties to assess the impact of the showerhead pattern and track progress towards its elimination.
By systematically investigating the potential causes and implementing appropriate solutions, you can overcome the persistent showerhead pattern issue and achieve uniform, high-quality nitride coatings using your Trion Orion PECVD system.
- Badges
- Science topic
- Similar topics
- Mathematics
- Algebra
- Matrix