We want to deposite a fine pattern ( 100-300 nm thick and 10 microns wide pattern) of Pt as temperature sensors on a polysterene substrate with a glass temperature of 95 degrees C.
How would you go about this without dissloving the polysterene?
You can use the subtracting method. Which means you can deposit a platinum layer and you can pattern it by selective etching of platinum. Where you can use a photolithographic step to pattern the metal. This method is used routinely in patterning printed circuit boards and electronic chips.
Another method is to use mechanical masks where you can deposit platinum through them.
You can use the subtracting method. Which means you can deposit a platinum layer and you can pattern it by selective etching of platinum. Where you can use a photolithographic step to pattern the metal. This method is used routinely in patterning printed circuit boards and electronic chips.
Another method is to use mechanical masks where you can deposit platinum through them.