Hello,

I have built a Mach-Zhender interferomer in order to irradiate thin films of polymer (PMMA) with an interference pattern. These polymer thin films are doped with metallic precursors, and the goal is to fabricate array of nanoparticles in situ by photoreduction.

I'm not familiar with this type of system and I would like to now is there is a specific way to align, tune the interferometer? (I joined a scheme of my setup in  the attached file, the quarter wave plate can be removed). I specify that I'm only trying to generate a n intensity interference pattern (no weird polarization configurations).

Firstly, at the beginning I tried to use a spatial filter, as it is usually done (I did my bibliography by looking a Surface Relief Grating inscription on azopolymer films). However I always get circular fringes at the exit of the spatial filter, I don't really understand why as I really tried to choose the right pin hole to select only the center of the airy pattern. I'm now using a beam expander instead but I'm limited concerning the size of the output beam. Would someone know what I'm doing wrong with the spatial filter? 

Then concerning the two mirrors used to orientate the beams, I just align them by eyes to there are superposed on my sample? Is it ok? How can I maximise the fringe's contrast?

Thank you,

Elie

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